Maskless Lithography UV Laser Writer | SIMTRUM Photonics Store

Split-ring resonator arrays. The distance on the right is 1.5 µm (arrow), 

separation distance on the left is 2 µm. The outer ring is 80 µm across. 

开环谐振器阵列。右侧的分离距离为1.5µm (箭头)，左侧的分离距离为 2 µm。 

外圈直径为 80 µm。

Array of resist micropatterns on silicon substrate. Each cell is 50 ✕ 63 µm, 

with 3 µm spacing between adjacent patterns. Resist used: AZ5214E

硅衬底上的光刻胶微图案阵列。 每个单元为 50 × 63 µm，相邻图案之间的间距为

 3 µm。 使用的光刻胶：AZ5214E

0.8 µm tapered middle section with 20 ✕ 90 µm contact pads on the side. 

Resist used: AZ5214E

0.8 µm 锥形中间部分，侧面有 20 ✕ 90 µm 接触电极。 使用的光刻胶：AZ5214E

Acts as a minimap of the entire sample stage. Loaded patterns and exposed areas can be viewed. The black bos shows the regin that the BEAM ENGINE is currently at. The live video stream on the camera window also corresponds to the same area.

充当整个样本阶段的小地图。 可以查看加载的图案和暴露区域。 黑色 bos 显示 BEAM ENGINE 当前所在的区域。 摄像头窗口上的实时视频也对应相同的区域。

The camera window shows a live stream of what the BEAM ENGINE is looking at. The camera window also plays an important role during alignment, where the chosen alignment features appear overlaid on the amera stream.

摄像头窗口显示 BEAM ENGINE 下方的图案。 相机窗口在对齐过程中也起着重要作用，其中选定的对齐特征显示在 amera 流上。

2 µm guaranteed,  0.8 µm achievable (0.8µm可实现）

3 µm guaranteed,  2 µm achievable (2µm可实现)

Minimum Pitch 最小间距

Exposure Time 曝光时间

Maximum Writefield 最大写场

Laser Power 激光能量

Laser Wavelength 激光波长

Laser Galvo 激光振镜

Step Size 步径

Repeatability 重复性

Speed 速度

Motorized Stepper 

电动平台

Encoder Resolution 编辑器分辨率

Stage Repeatability (1σ)载物台重复性

Movement Area 移动区域

Largest Sample Size 最大样本尺寸

Wafer Alignment 晶圆对齐 

Multilayer processes supported  支持多层工艺

Single-layer processes supported*   支持单层工艺*

Software 软件 

Patterning 图案

Design 设计

KLayout (most powerful最强大),   MS Paint/Powerpoint (rapid prototyping快速原型设计)

Weight 重量

System Size 系统尺寸

    Modular Laser Head

      Swappable optics minimizes downtime and increases upgradeability.

      可更换的光学元件可最大限度地减少停机时间并提高可升级性。

      Customization options are available for different wavelengths and write 

      field sizes. Contact us info@simtrum.comfor more info.

      定制选项可用于不同的波长和写场大小。联系我们 info@simtrum.com

      了解更多信息 。

System Requirements 

Power 功率

BEAM opeartes on 100-240 VAC 50-60j Hz. Line voltage and frequency are automatically sensed; therefore, no swithces are to be set. Check that the operating voltagein your area is compatible. BEAM 在 100-240 VAC 50-60j Hz 上运行。 自动感应线路电压和频率； 因此，无需设置任何开关。 检查您所在地区的工作电压是否兼容。

Location 放置环境

●  Indoor, dust free, near-non-conductive pollution (degree 2 of EN61010-1:2010) 室内、无尘、近非导电污染（EN61010-1:2010 2 级）

●  Tabletop vibration should be kept under VC-A (50 um/s) 桌面振动应保持在 VC-A (50 um/s) 以下

●  Cleanroom environment is optional 非超净间环境下可使用 (Vibration Reference link)

●  Equipment must be shaded from indirect sunlight 设备必须避免阳光直射

●  Relative humidity < 80% (no condensation) 相对湿度 < 80%（无冷凝）

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