Sign In

  • Forgot your password?
  • Need a new account?

Register


Two-photon 3D printing microscope

SIMSCOP Two-Photon 3D Printing Microscope is designed for high-end scientific research and industrial micro-nano manufacturing. Integrating single-focal/multi-focal holographic parallel scanning, grayscale modulation exposure, and dynamic focus positioning technology, it achieves a flexible balance among fabrication precision, forming speed, and manufacturing efficiency.

The system is compatible with a wide range of substrates, including transparent, opaque, and flexible polymers. It is suitable for integrated photonics, metasurfaces, biochips, micro-nano mechanics, direct laser writing on optical fibers, and microfluidics, providing a stable and reliable platform for scientific exploration, process development, and large-scale production.

SIMSCOOP Two-Photon 3D Printing Microscope
SIMSCOOP Two-Photon 3D Printing Microscope
 

Performance Advantages

Focusing on surface quality, fabrication speed, long-term stability, and software usability, it forms an end-to-end manufacturing capability ranging from fine structures to large-area arrays.

01  Superior Surface Quality

Continuous grayscale exposure precisely controls spatial light intensity, reducing interlayer stepping and scanning stitching artifacts, achieving surface roughness of Ra < 20 nm.

02  Faster Fabrication Speed

Multi-focal holographic parallel exposure combined with multi-channel synchronous scanning yields single-channel speeds up to 6 m/s, with standard configurations supporting up to 25 parallel channels.

03  Enhanced Manufacturing Uniformity

Auto-focus coupled with a 1 nm class piezo XYZ stage compensates for tilt, flatness, mechanical drift, and thermal effects to maintain long-term positioning and focus lock.

04  Comprehensive Software Capabilities

Supports STL / DXF / GDSII import, grayscale slicing, path planning, visual editing, parametric design, and batch manufacturing.

Measured Performance Comparison

Figures 1 and 2 compare structural surface results under different exposure methods, demonstrating that grayscale exposure achieves superior surface roughness. Figure 3 illustrates the overall result of large-area thin-film direct writing, while Figure 4 provides a magnified view of Figure 3, highlighting the system's ability to maintain high uniformity across large-area processing.

Superior Surface Roughness Higher Fabrication Uniformity
TPL FAST Binary Exposure Microlens Array
Fig. 1 TPL FAST
Binary exposure surface effect
TPL GRAY Grayscale Exposure Microlens Array
Fig. 2 TPL GRAY
Grayscale exposure, Ra < 20 nm
Thin Film Large-Area Direct Writing
Fig. 3 Large-Area Film Writing
Overall continuous writing effect
Thin Film Direct Writing Magnified Details
Fig. 4 Fig. 3 Magnified View
Local lines maintain excellent uniformity
 

Core Specifications

Fabrication Speed
Single channel 6 m/s; up to 25 parallel channels
Surface Quality
Grayscale exposure, surface roughness Ra < 20 nm
Field of View
Stitchless diameter up to 2,650 µm (10× objective)
Positioning
Feedback
Laser ranging real-time feedback for surface height & process status
Material
Compatibility
Positive / negative / grayscale resists, various rigid & flexible substrates
File Formats
STL / DXF / GDSII

Typical Applications

• Microlens Arrays • Micro-Nano Mechanical Structures • Thin-Film Direct Laser Writing
• Optical Microstructures • Metasurfaces • Wafer-Level Batch Manufacturing

Accommodating both transparent and non-transparent substrates, as well as planar and curved surfaces, it covers multi-level demands ranging from fundamental research and prototype validation to large-scale array manufacturing.

 

Application Cases

Spanning micro-optics, micro-mechanics, thin-film fabrication, and metasurfaces, supporting multi-scale, arrayed, and complex 3D structure manufacturing.

Microlens Array
Microlens Array
Micromechanical Structure
Micromechanical Structure
3D Mechanical Structure
3D Mechanical Structure
Thin Film Direct Writing
Thin Film Direct Writing
Optical Microstructures
Optical Microstructures
Metasurface
Metasurface

Specifications

The SIMSCOP Two-Photon 3D Printing Microscope offers three configurations: TPL FAST, TPL GRAY, and TPL MULTI GRAY, covering high-speed single-focal point scanning, grayscale high-precision scanning, and multi-channel holographic parallel processing.

 
Parameter
TPL FAST
TPL GRAY
TPL MULTI GRAY
 
Printing Mode
High-speed single-focal point scanning printing
Single-focal point grayscale high-precision scanning printing
Multi-channel holographic parallel scanning printing
Laser
Module
Light Source Type
Solid-state femtosecond Ti:Sapphire oscillator (Fs-Oscillator), optional fully integrated femtosecond fiber laser
High-power solid-state femtosecond Ti:Sapphire oscillator (Fs-Oscillator), optional fully integrated femtosecond fiber laser
Wavelength Configuration
775–800 nm
Pulse Width
≤ 100 fs
Repetition Rate
80 MHz (Oscillator) / Optional fiber laser 50–100 MHz
Output Power
50–200 mW
> 1 W
Power Control
Not supported
0–100% continuous control, 0.1% control precision
Output Type
Free-space output (Optional single-fiber output)
Beam Management
Includes dispersion compensation module
Scanning
Module
Architecture Type
High-speed single-focal point galvo scanning module (Binary)
High-speed single-focal point galvo scanning module with grayscale modulation module
Multi-channel holographic parallel scanning module with grayscale modulation module
Core Components
2D high-precision dual-axis large-aperture high-speed galvo scanner
2D high-speed galvo + high-speed AOM grayscale modulation module
High-resolution phase-only LCoS spatial light modulator (2K/4K), holographic multi-channel control
Functionality
Single-focal point 2D scanning
Single-focal point scanning + point-by-point grayscale energy control, supporting gradient structures
Real-time generation of 1–25 focal spot arrays / Bessel beams / customized 3D holographic light fields, with grayscale modulation support
Scanning Speed
1–6 m/s
1–6 m/s
1–150 m/s
Resolution
Single field 200 × 200 µm, Lateral 150 nm / Axial 300 nm
Grayscale Capability
Fixed power adjustment supported
Dynamic adjustment supported, grayscale levels ≥ 256, sub-pixel energy control
Typical Surface Roughness (Ra)
< 100 nm
< 20 nm
Minimum Feature Size
80 nm
Parallel Throughput
1x
1x
25x
Imaging
Module
Imaging System
Coaxial wide-field microscopic imaging system
Illumination Light Source
Independent yellow LED microscopic illumination
Camera Specifications
C-mount sCMOS camera * (Compatible with CCD/EMCCD cameras);
95%@600nm Peak QE  |  6.5 µm × 6.5 µm Pixel Size  |  2048 × 2048 Resolution  |  13.3 mm × 13.3 mm Effective Area  |  Noise: 0.2e−  |  Full-Well Capacity: 45Ke−  |  Water-cooling and air-cooling compatible
Motion
Module
Travel Range
200 mm 3-axis (Customizable extension up to 500 mm)
Closed-Loop Feedback
Grating scale closed-loop feedback, 100 nm positioning accuracy, 50 nm repeatability
Piezo Stage
3-axis piezo stage, travel: 100/200 µm, accuracy 1 nm (Optional)
3-axis piezo stage, travel: 100/200 µm, accuracy 1 nm
3-axis piezo stage, travel: 100/200 µm, accuracy 1 nm
Positioning System
Optional laser interferometric distance measurement or total internal reflection confocal interface positioning system
Axial Focus Locking Accuracy
< 20 nm
Software
& Control
Control Software
Intuitive automated control software supporting STL/DXF/GDSII import and visual editing
Intuitive automated control software supporting STL/DXF/GDSII import and visual editing, grayscale slicing, and gradient path planning
Intuitive automated control software supporting STL/DXF/GDSII import and visual editing, grayscale slicing, gradient path planning, parallel channel scheduling, and grayscale exposure path planning
Structure Library
Built-in standard structure library, supporting parametric design and batch processing
Built-in standard structure library supporting parametric design and batch processing, plus parametric design for grayscale micro-optics
Built-in standard structure library supporting parametric design and batch processing, parametric design for grayscale micro-optics, and large-scale array/wafer-level parallel manufacturing
Scanning Strategy
Adaptive scanning, real-time feedback and process monitoring, traceable process data
Adaptive grayscale scanning, real-time feedback and process monitoring, traceable process data
Adaptive parallel grayscale scanning, real-time feedback and process monitoring, traceable process data
Typical
Applications
Application Fields
Integrated photonics, micro-nano mechanics, direct laser writing on fibers, scientific sample preparation
Microlens arrays, DOE diffractive optics, freeform micro-optics, gradient-index (GRIN) structures
Metasurfaces, large-scale micro-nano arrays, biochips/microfluidics, wafer-level parallel manufacturing
Photoresist
Supports various two-photon photoresists (positive / negative)
Supports various two-photon photoresists (positive / negative / grayscale photoresists)
Supports various two-photon photoresists (positive / negative / grayscale photoresists)
Substrates
Opaque glass, optical fiber facets, silicon wafers, quartz, sapphire, transparent conductive substrates, flexible polymers (PDMS, SU-8, PMMA, etc.)

* Specific configurations and technical specifications may vary based on optional packages; please refer to the final technical agreement.



Search Reset
Compare Model Drawings & Specs Availability Reference Price
(USD)

Accessories

Compare Model Drawings & Specs Availability Reference Price
(USD)